Which element of group 14 forms only one hydride?
1. C
2. Si
3. Sn
4. Pb
The thermal stability order for group 14 halides is:
1.
2.
3.
4.
The correct statement regarding polymeric silicon dioxide is -
1. | Each silicon atom is surrounded by four oxygen atoms and each oxygen atom is bonded to two silicon atoms. |
2. | Each silicon atom is surrounded by two oxygen atoms and each oxygen atom is bonded to two silicon atoms. |
3. | Silicon atom is bonded to two oxygen atoms. |
4. | These are double bonds between silicon and oxygen atoms. |
AlF3 is soluble in HF only in the presence of KF due to the formation of:
1. | K3[AlF3H3] | 2. | K3[AlF6] |
3. | AlH3 | 4. | K[AlF3H] |
The correct statement among the following is :
1. | Sn2+ is an oxidizing agent while Pb4+ is a reducing agent. |
2. | Sn2+ and Pb2+ both are oxidizing agents. |
3. | Sn4+ is a reducing agent while Pb4+ is an oxidizing agent. |
4. | Sn2+ is a reducing agent while Pb4+ is an oxidizing agent. |
An element that cannot form ion is-
1. | Ga | 2. | Al |
3. | B | 4. | In |
The correct order of atomic radii of the group 13 elements is-
1. B < Al < In < Ga < Tl
2. B < Al < Ga < In < Tl
3. B < Ga < Al < Tl < In
4. B < Ga < Al < In < Tl
In which of the following pairs, both the species are not isostructural?
1. \(\mathrm{SiCl}_4, \mathrm{PCl}_4^{+}\)
2. Diamond, silicon carbide
3. \(\mathrm{NH}_3, \mathrm{PH}_3\)
4. \(\mathrm{XeF}_4, \mathrm{XeO}_4\)
The stability of +1 oxidation state among Al, Ga, In and Tl increases in the sequence?
1. Ga < ln < Al < Tl
2. Al < Ga < ln < Tl
3. Tl < ln < Ga < Al
4. ln < Tl < Ga < Al